Sample Preparation Lab(prepLab)

The Sample Preparation Facility (prepLab) is a new, high-precision sample preparation facility – located in 329 Cobleigh Hall. This facility allows preparation of ultra-high quality polished specimens for SEM, TEM, EDX, nano-Auger, EBSD and other microbeam analysis requiring flat, smooth, and damage-free surfaces. 

For the Sample Preparation Lab click here.

Current Instrumentation

Alex with IONTOF ToF-SIMS Instrument

Time-of-Flight Secondary Ion Mass Spectrometer (ToF-SIMS)

Cameca ION TOF IV

  • Holds a mass resolution of 0.00x amu
  • Allows for a mass range of 0-10,000 amu
  • Can trace element detection limits in the ppm range
  • Able to create sub-micron imaging to map any mass number of interest
  • Reports a retrospective analysis
  • MORE INFORMATION »
Zeiss FESEM Instrument in ICAL

Field Emission Scanning Electron Microscope(FE SEM)

Zeiss SUPRA 55VP

  • The FE SEM can analyze surfaces down to nanometers in high vacuum or variable pressure models.
  • A Powerful and easy to use system for electro beam lithography
  • Has enough capicity for even the largest of specimens
  • Ultra high resolution at low kV: 1.7nm @ 1.0kV, 4 nm @ 0.1kV
  • MORE INFORMATION »
Carbon Coater in ICAL

Pella Carbon Coater for SEM sample prep

108 Carbon Coater

  • High quality desktop vacuum coating systems
  • 108 series sputter coaters for standard SEM and  EDS sample coating
  • Its dedicated thickness measurement system offers tight controls to create the desired coating thickness
  • Better and more uniform coating on topographic samples
  • Easy to use
  • MORE INFORMATION »
X-ray Diffraction Instrument in ICAL

Bruker D8 Advance Powder X-ray Diffractometer

D8 Advance

  • Features a unique D8 diffractometer family platform, perfect for all X-ray powder diffraction and scattering application
  • In addition, there is a pair distribution function for analysis
  • The D8 Advance is also adaptable in its measuring and can measure any sample type from liquids, gases, loose powders, and thin films
  • MORE INFORMATION »
Photo of Atomic Force Microscope

Atomic Force Microscope (AFM)

VEECO MultiMode V and Dimension 3100

  • Imaging of conducting and non-conducting surfaces
  • Sub-nanometer resolution
  • Imaging in air and liquid, allowing in-situ measurements and real time imaging of biological and chemical processes
  • AFM can be used to measure and localize many different forces including: adhesion strength, magnetic forces and mechanical properties
  • True 3D imaging and measurements
  • Magnetic, friction, chemical, and phase imaging
  • MORE INFORMATION »

 

Scanning Electron Microscope

Scanning Electron Microscope (SEM)

JEOL JSM-6100
  •  Secondary Electron Imaging (SEI)
  • Backscattered Electron Imaging (BEI)
  • Cathodo-Luminescence detection and imaging (CL)
  • Energy Dispersive x-ray Spectroscopy (X-Flash fast X-ray mapping detector)
  • Cryo-preparation chamber with cold / hot stage
  • High-resolution imaging
  • Digital image capture
  • Quantitative elemental analysis of the "bulk" material
  • Fast elemental mapping and / or linescan of area of interest
  • Topographical and density imaging
  • Detection of small variations of trace element content
  • Analysis and Imaging of samples in their natural, hydrated state
  • MORE INFORMATION »

 

Photo of instrument X-ray Photoelectron Spectrometer

X-ray Photoelectron Spectrometer (XPS)

Physical Electronics 5600
  •  Elemental identification and quantification
  • Chemical functional group identification and quantification
  • Chemical state imaging
  • Surface sensitivity
  • Layer-by-layer depth profiling
  • Minimal sample damage
  • Analysis of insulating and conducting samples
  • Data collection / stage automation
  • Cold stage
  • MORE INFORMATION »

 

Photo of Scanning Auger Electron Nanoprobe

Scanning Auger Electron Nanoprobe (AUGER)

Physical Electronics 710
  •  Rapid sample introduction
  • Low-Z elemental detection
  • Quantitative analysis, mapping, linescan for AES and EDS
  • Surface sensitivity of 1-5 nm
  • Enhanced lateral spatial resolution for elemental analysis (<8 nm with a 20kV, 1nA electron beam )
  • Limited chemical information
  • Sputter depth profiling (three dimensional analysis)
  • High resolution secondary electron imaging of analysis area
  • MORE INFORMATION »

 

Photo of Epifluorescence Optical Microscope

Epifluorescence Optical Microscope

OLYMPUS BX-61
  •  Precision objectives including air, oil and water immersion objectives
  • Suite of reflected (fluorescent) filters (DAPI, FITC/CY2, TRITC/CY3, triple band and RBF)
  • Significantly reduced autofluorescence and signal-to-noise ratio
  • DIC imaging (10x, 20x, 40x, 60x)
  • Digital camera imaging for still and time-lapse observations
  • MORE INFORMATION »

 

Photo of Critical Point Dryer

Critical Point Dryer (CPD)

Tousimis SAMDRI-795
  •  Alternative to air drying for vacuum samples
  • Reduces imaging artifacts 
  • Uses liquid CO2
  • MORE INFORMATION »