The Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) is a method that uses a pulsed ion beam to take the outermost molecules on a surface to create secondary ions. This method allows for high mass resolution for surface imaging, high analytic sensitivity, and the profiling of depth in an image. It is ideal for medical, energy, thin film, and nano devices.

In summary, the ToF-SIMS Time-of-Flight Secondary Ion Mass Spectrometer can provide the following:

  • Mass resolution of 0.00x amu
  • Mass range of 0-10,000 amu
  • Trace element detection limits in the ppm range
  • Sub-micron imaging to map any mass number of interest
  • Depth profiling capabilities
  • Retrospective analysis